Also, process parameters and properties of copper films deposited from precursors applying vital ligand devices such as aminoalkoxides, amidinates, guanidinates, betadiketonates and betaketoiminates are introduced. Surface chemistry is examined with the viewpoint with the similarities of CVD and ALD, taking into consideration precursors which can be Employed in each types https://aldmaterials59484.is-blog.com/25137232/the-best-side-of-surface-coating